Growth properties and structural analysis of ZnO films and of Au clusters on ZnO
Creators
Description
We have studied the possibility to grow O-terminated ZnO(0 0 0 1-bar) films on Al2O3 substrates with high epitaxial quality. After growth via sputtering methods, the ZnO films were annealed to increase the film quality resulting in a mosaicity of 0.60 deg. and a surface roughness of <3 Angst. Finally, gold films were sputtered at room temperature on the surface. The structural properties of the samples were investigated by X-ray scattering, reflection high-energy electron diffraction (RHEED) and by atomic force microscopy (AFM). AFM images clearly demonstrate that gold films with a nominal thickness of <50 Angst form clusters, which can be as high as 300 Angst. X-ray diffraction (XRD) studies reveal a predominant (1 1 1) texture of the clusters. Further deposition of Au leads to coalescing clusters smoothing out the surface
Additional details
Identifiers
- PII
- S0169433202011212;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 205
- Journal Issue
- 1-4
- Journal Page Range
- p. 329-335
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38069831
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM OXIDES; ANNEALING; ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRON DIFFRACTION; EPITAXY; FILMS; GOLD; SPUTTERING; SURFACES; TEMPERATURE RANGE 0273-0400 K; X-RAY DIFFRACTION; ZINC OXIDES
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; DIFFRACTION; ELEMENTS; HEAT TREATMENTS; METALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; SCATTERING; TEMPERATURE RANGE; TRANSITION ELEMENTS; ZINC COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2002 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.