Search for solute drag
Creators
- 1. Oak Ridge National Lab., TN
Description
Galvin et al. have shown that during resolidification subsequent to pulsed-laser melting, the solid-liquid interface slows down when it encounters a doped region. This was predicted by Aziz on the basis of theoretical considerations of free energy dissipation. Several possible sources of this velocity reduction have been identified. In order to distinguish between these effects and to make a quantitative comparison between theory and experiment, a system whose thermodynamic and thermophysical parameters are well known must be used; at present, Si-Ge is the only such semiconductor system. The authors are investigating this phenomenon by the ion implantation of Ge into Si and of Si into Ge. The interface velocity v has been measured by the transient conductance technique
Additional details
Publishing Information
- Imprint Title
- Solid State Division progress report for period ending September 30, 1984
- Journal Page Range
- p. 70.
- Report number
- ORNL--6128
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 18001699
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- GERMANIUM; INTERFACES; ION IMPLANTATION; SILICON; SOLIDIFICATION; THERMAL CONDUCTIVITY
- Descriptors DEC
- ELEMENTS; METALS; PHYSICAL PROPERTIES; SEMIMETALS; THERMODYNAMIC PROPERTIES