Published March 1985 | Version v1
Report

Search for solute drag

Description

Galvin et al. have shown that during resolidification subsequent to pulsed-laser melting, the solid-liquid interface slows down when it encounters a doped region. This was predicted by Aziz on the basis of theoretical considerations of free energy dissipation. Several possible sources of this velocity reduction have been identified. In order to distinguish between these effects and to make a quantitative comparison between theory and experiment, a system whose thermodynamic and thermophysical parameters are well known must be used; at present, Si-Ge is the only such semiconductor system. The authors are investigating this phenomenon by the ion implantation of Ge into Si and of Si into Ge. The interface velocity v has been measured by the transient conductance technique

Additional details

Publishing Information

Imprint Title
Solid State Division progress report for period ending September 30, 1984
Journal Page Range
p. 70.
Report number
ORNL--6128

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
18001699
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
GERMANIUM; INTERFACES; ION IMPLANTATION; SILICON; SOLIDIFICATION; THERMAL CONDUCTIVITY
Descriptors DEC
ELEMENTS; METALS; PHYSICAL PROPERTIES; SEMIMETALS; THERMODYNAMIC PROPERTIES