Published December 6, 2012 | Version v1
Journal article

Electron spin resonance study of point defects in thermal GaAs/GaAs-oxide structures

  • 1. Semiconductor Physics Laboratory, Department of Physics, University of Leuven, 3001 Leuven (Belgium)

Description

In an attempt to atomically assess interface and oxide-related point defects, a first basic multifrequency low-temperature electron spin resonance study has been carried out on semi-insulating (Fe compensated) GaAs/oxide structures, implying both powders and (100)GaAs/oxide slices, thermally grown in the range Tox=350–615 °C. Various spectra are observed: As for powders, this includes the 4-line EL2 defect spectrum centered at g∼2.043 and characterized by the isotropic hyperfine constant Aiso∼ 910 G, ascribed to the 75AsGa+ antisite defect. Observed in freshly crushed powder, it substantially increases in density with oxidation, in line with theoretical expectation; A maximum appears reached for at Tox∼440 °C. It is not observed in the parent c-GaAs wafer. A second isotropic signal is observed at g∼1.937 in powders for Tox in the range 510–615 °C, but only after additional VUV irradiation; it may correspond to As clusters. In bulk (100)GaAs, we observe the 5-branch spectrum of substitutional Fe impurities (spin S=5/2) in GaAs, with inferred crystal field constant a ≈ 360 G, well in line with previous observations. The results are discussed within the framework of advanced theoretical interface and defect models and previous experimental assessment.

Availability note (English)

Available from http://dx.doi.org/10.1088/1757-899X/41/1/012021

Additional details

Publishing Information

Journal Title
IOP Conference Series. Materials Science and Engineering (Online)
Journal Volume
41
Journal Issue
1
Journal Page Range
[8 p.]
ISSN
1757-899X

Conference

Title
More than Moore: Novel materials approaches for functionalized silicon based microelectronics
Acronym
E-MRS 2012 Spring Meeting, Symposium M
Dates
14-18 May 2012
Place
Strasbourg (France)