Published 1983 | Version v1
Report Open

Clustering model in N-doped many-valley semiconductors

Description

The microscopic structure of the impurity states in n-silicon as an example of randomly distributed donor impurities in a diamond structure many-valley semiconductor is investigated. An improved Hartree-Fock-Roothaan scheme with spin-polarized potentials and a Kohn-Luttinger donor wave function associates with each impurity were used in the calculation. It is shown that the many-valley character of the host gives rise to a distribution of impurity clusters of various sizes, quite different from the case of neglecting the valley multiplicity, and that is strongly reduces the self-compensation effect due to the potential fluctuation. The results are in agreement with recent investigations that have appeared in the literature. (Author)

Availability note (English)

MF available from INIS under the Report Number.

Abstract (Portuguese)

Investiga-se a estrutura microscopica dos estados de impureza em silicon-n como um exemplo de impurezas doadoras distribuidas aleatoriamente num semicondutor de muitos vales de estrutura de diamante. Usa-se no calculo um esquema melhorado de Hartree-Fock-Roothaan com potenciais spin-polarizados e uma funcao de onda doadora de Kohn-Luttinger associada com cada impureza. Mostra-se que o caracter de muitos-vales do hospedeiro da surgimento a uma distribuicao de aglomerados de impurezas de varios tamanhos, bem diferente do caso de desprezo da multiplicidade do vale, e que ele reduz fortemente o efeito de auto-compensacao devido a flutuacao do potencial. Os resultados estao em acordo com investigacoes recentes que tem aparecido na literatura. (L.C.)

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Additional details

Publishing Information

Imprint Pagination
33 p.
Report number
INPE--2911