Published October 12, 2011 | Version v1
Journal article

Strained silicon modulation field-effect transistor as a new sensor of terahertz radiation

  • 1. Departamento de Fisica Aplicada, Universidad de Salamanca, Salamanca (Spain)
  • 2. Research Institute of Electrical Communication, Tohoku University, 980-8577 Sendai (Japan)
  • 3. Department of Electrical and Electronic Engineering, Imperial College London (United Kingdom)

Description

In this paper, we report on room temperature detection of terahertz radiation from strained-Si modulation-doped field-effect transistors. A non-resonant signal was observed with a maximum around the threshold voltage. The signal was interpreted due to the plasma wave nonlinearities in the channel. The intensity of the signal increases for the higher applied drain-to-source current. We also observed a dependence of the signal on the polarization of the incoming radiations

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/26/10/105006

Additional details

Identifiers

DOI
10.1088/0268-1242/26/10/105006;
PII
S0268-1242(11)92508-5;

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
26
Journal Issue
10
Journal Page Range
[4 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45014414
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
DETECTION; DOPED MATERIALS; ELECTRIC POTENTIAL; FIELD EFFECT TRANSISTORS; PLASMA WAVES; POLARIZATION; SENSORS; SIGNALS; SILICON; STRAINS
Descriptors DEC
ELEMENTS; MATERIALS; SEMICONDUCTOR DEVICES; SEMIMETALS; TRANSISTORS