The development of the spatially correlated adjustment wavelet filter for atomic force microscopy data

In this paper a novel approach for the practical utilization of the 2D wavelet filter in terms of the artifacts removal from atomic force microscopy measurements results is presented. The utilization of additional data such as summary photodiode signal map is implemented in terms of the identification of the areas requiring the data processing, filtering settings optimization and the verification of the process performance. Such an approach allows to perform the filtering parameters adjustment by average user, while the straightforward method requires an expertise in this field. The procedure was developed as the function of the Gwyddion software. The examples of filtering the phase imaging and Electrostatic Force Microscopy measurement result are presented. As the wavelet filtering feature may remove a local artifacts, its superior efficiency over similar approach with 2D Fast Fourier Transformate based filter (2D FFT) can be noticed. - Highlights: • A novel approach to 2D wavelet-based filter for atomic force microscopy is shown. • The additional AFM measurement signal is used to adjust the filter. • Efficient removal of the local interference phenomena caused artifacts is presented.