Study of the SnOx thin films optical transmission spectra after the hydrogen plasma treatment

The study of the SnOx optical properties modification after the hydrogen plasma treatment is carried out. The SnOx films with thickness ∼300 nm were manufactured on the glass substrate by the magnetron sputtering method in the argon-oxygen atmosphere (oxygen content ≤10 %). The optical transmission spectra of the film-substrate system were studied on the SF-256 UVI spectrophotometer in 190-1100 nm wave length range. The samples have been annealed during 2 hours at 550 Deg. C and treated by the hydrogen plasma of the glow discharge. Measurement of transmission spectra showing that the hydrogen plasma treatment carried out immediately after its deposition and after following annealing leads to distinct decrease of transmission coefficients. As well as it is noticed, that film treatment in annealing-plasma-annealing regime leads to considerable film antireflection and transmission spectrum shift to more short-wave length side. On the base of obtained data the possibility for plasma treatment use for anti-reflecting tin dioxide manufacture in examined wave range is discussed