Published November 1986 | Version v1
Journal article Metadata-only

Structure of thin films of hafnium and hafnium dioxide on silicon

Creators

  • 1. O.V. Kuusinen State University, Petrozavodsk

Description

The anodic oxide film of HfO2 of Hf is polycrystalline and untextured; its phase composition is represented by thermonoclinic and tetragonal modifications; their ratio changes with the oxidation time toward increasing quantity of the monoclinic phase

Additional details

Publishing Information

Journal Title
Inorg. Mater. (Engl. Transl.)
Journal Volume
22
Journal Issue
6
Series
Inorg. Mater. (Engl. Transl.).
Journal Page Range
847-849
ISSN
0020-1685
CODEN
INOMA

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
18055262
Subject category
S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
Descriptors DEI
ANODIZATION; CATHODE SPUTTERING; CRYSTAL-PHASE TRANSFORMATIONS; HAFNIUM; HAFNIUM OXIDES; MONOCLINIC LATTICES; OXIDATION; POLYCRYSTALS; SILICON; STRUCTURAL CHEMICAL ANALYSIS; TETRAGONAL LATTICES; THIN FILMS; TIME DEPENDENCE; X-RAY DIFFRACTION
Descriptors DEC
CHALCOGENIDES; CHEMICAL COATING; CHEMICAL REACTIONS; COHERENT SCATTERING; CORROSION PROTECTION; CRYSTAL LATTICES; CRYSTAL STRUCTURE; CRYSTALS; DEPOSITION; DIFFRACTION; ELECTROCHEMICAL COATING; ELECTROLYSIS; ELEMENTS; FILMS; HAFNIUM COMPOUNDS; METALS; OXIDES; OXYGEN COMPOUNDS; PHASE TRANSFORMATIONS; SCATTERING; SEMIMETALS; SPUTTERING; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS

Optional Information

Notes
Cover-to-cover translation of Izvestiya Akademii Nauk SSSR, Neorganicheskie Materialy (USSR).