Published 1997 | Version v1
Journal article

Determination of trace elements in a silicon single crystal

  • 1. Kyoto Univ. (Japan)
  • 2. Fujitsu Labs. Ltd., Kawasaki, Kanagawa (Japan)

Description

Instrumental neutron activation analysis was applied to the determination of trace impurity elements in a silicon single crystal. Impurity concentrations in polysilicon melt were compared with those in a single crystal. Impurity concentrations in artificial quartz were also compared with those in natural quartz. Segregation coefficients in Au, Ir and Sb were determined at different concentrations. The segregation coefficient of an element in a silicon single crystal is constant over a critical concentration, it becomes larger gradually under the critical one, and at last it becomes larger than 1. (author)

Part of:
Modeling of iron adsorption on HTTA-loaded polyurethane foam using Freundlich, Langmuir and D-R isotherm expressions

Additional details

Publishing Information

Journal Title
Journal of Radioanalytical and Nuclear Chemistry
Journal Volume
216
Journal Issue
2
Journal Page Range
p. 165-169.
ISSN
0236-5731
CODEN
JRNCDM

Conference

Title
9. International conference on modern trends in activation analysis.
Dates
24-30 Sep 1995.
Place
Seoul (Korea, Republic of).

INIS

Country of Publication
Hungary
Country of Input or Organization
Hungary
INIS RN
28040478
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
IMPURITIES; MELTING; MONOCRYSTALS; NEUTRON ACTIVATION ANALYSIS; QUARTZ; SEGREGATION; SILICON; TRACE AMOUNTS
Descriptors DEC
ACTIVATION ANALYSIS; CHEMICAL ANALYSIS; CRYSTALS; ELEMENTS; MINERALS; NONDESTRUCTIVE ANALYSIS; OXIDE MINERALS; PHASE TRANSFORMATIONS; SEMIMETALS

Optional Information

Notes
5 refs.