Published June 2, 2008 | Version v1
Journal article

Temperature-independent electron tunneling injection in tris (8-hydroxyquinoline) aluminum thin film from high-work-function gold electrode

  • 1. Core Research for Evolutional Science and Technology Program, Japan Science and Technology Agency, 1-32-12 Higashi, Shibuya, Tokyo 150-0011 (Japan)
  • 2. Center for Future Chemistry, Kyushu University, 744 Motooka, Nishi, Fukuoka 819-0395 (Japan)

Description

We fabricated electron-only tris (8-hydroxyquinoline) aluminum (Alq3) single-layer devices with a device structure of glass substrate/MgAg anode (100 nm)/Alq3 layer (100 nm)/metal cathode (100 nm), and systematically varied the work functions (WF) of the metal cathodes from WF = - 1.9 (Cs) to - 2.9 (Ca), - 3.8 (Mg), - 4.4 (Al), - 4.6 (Ag), and - 5.2 eV (Au) to investigate how electron injection barriers at the cathode/Alq3 interfaces influence their current density-voltage (J-V) characteristics. We found that current densities at a certain driving voltage decrease and the temperature dependence of J-V characteristics of the devices gradually becomes weaker as the work functions of the metal cathodes are decreased. The device with the highest-work-function Au cathode exhibited virtually temperature-independent J-V characteristics, suggesting that a current flow mechanism of this device is mainly controlled by electron tunneling injection at the Au/Alq3 interface

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2008.02.012

Additional details

Identifiers

DOI
10.1016/j.tsf.2008.02.012;
PII
S0040-6090(08)00172-7;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
516
Journal Issue
15
Journal Page Range
p. 5069-5074
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.