Published March 26, 2007 | Version v1
Journal article

(In)GaSb/AlGaSb quantum wells grown on Si substrates

  • 1. National Institute of Information and Communications Technology (NICT), 4-2-1, Nukui-Kitamachi, Koganei, Tokyo 184-8795 (Japan)
  • 2. Doshisha University, 1-3, Tatara-Miyakodani, Kyotanabe-shi, Kyoto 610-0321 (Japan)

Description

We have successfully grown GaSb and InGaSb quantum wells (QW) on a Si(001) substrate, and evaluated their optical properties using photoluminescence (PL). The PL emissions from the QWs at room temperature were observed at around 1.55 μm, which is suitable for fiber optic communications systems. The measured ground state energy of each QW matched well with the theoretical value calculated by solving the Schroedinger equation for a finite potential QW. The temperature dependence of the PL intensity showed large activation energy (∼ 77.6 meV) from QW. The results indicated that the fabricated QW structure had a high crystalline quality, and the GaSb QW on Si for optical devices operating at temperatures higher than room temperature will be expected

Additional details

Identifiers

DOI
10.1016/j.tsf.2006.07.131;
PII
S0040-6090(06)00952-7;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
10
Journal Page Range
p. 4467-4470
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
3. International conference on materials for advanced technologies: Symposium J-III-V- Semiconductors for microelectronic and optoelectronic applications
Acronym
ICMAT 2004
Dates
3-8 Jul 2005
Place
Singapore (Singapore)

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.