Published November 1, 1988
| Version v1
Journal article
Formation and thermal stability of vapor-deposited amorphous Ni-Zr thin films
- 1. Philips Research Laboratories, P. O. Box 80000, 5600 JA Eindhoven, The Netherlands
Description
The formation range and thermal stability of vapor-deposited, amorphous Ni/sub 1-//sub x/Zr/sub x/ thin films is studied and compared with previous results for melt-spun ribbons and also with a thermodynamic prediction. Crystallization temperature and glass transition temperature for films and ribbons turn out to be nearly the same; the glass formation range for films is larger than that for ribbons and agrees very well with the thermodynamic prediction
Additional details
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 64
- Journal Issue
- 9
- Series
- J. Appl. Phys.
- Journal Page Range
- 4770-4771
- ISSN
- 0021-8979
- CODEN
- JAPIA
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 20001756
- Subject category
- S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
- Descriptors DEI
- AMORPHOUS STATE; COATINGS; CRYSTAL-PHASE TRANSFORMATIONS; CRYSTALLIZATION; NICKEL BASE ALLOYS; STABILITY; SURFACE COATING; SYNTHESIS; THICKNESS; THIN FILMS; ZIRCONIUM ALLOYS
- Descriptors DEC
- ALLOYS; DEPOSITION; DIMENSIONS; FILMS; NICKEL ALLOYS; PHASE TRANSFORMATIONS