Published November 1, 2010
| Version v1
Journal article
High-k HfTaO stacks in response to microwave irradiation
Creators
- 1. Institute of Solid State Physics, Bulgarian Academy of Sciences, Tzarigradsko Chaussee 72, Sofia 1784 (Bulgaria)
Description
The effect of microwave treatment (6-15 s) at room temperature on the leakage current and mechanisms of conductivity in mixed HfTaO (10 nm) stacks has been studied by temperature dependent (20-1000C) current-voltage characteristics. It was established that the short 6 s irradiation affects the electrically active centers in the stack, provokes modification of the dominant conduction mechanism and improves the temperature stability of capacitors manifesting as low level of current at high temperatures (current decrease up to 4 orders of magnitude at 1000C after the treatment is detected). The traps involved in the conduction process in pre- and post-irradiated capacitors are identified.
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/253/1/012038Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 253
- Journal Issue
- 1
- Journal Page Range
- [6 p.]
- ISSN
- 1742-6596
Conference
- Title
- 16. international school on condensed matter physics - Progress in solid state and molecular electronics, ionics and photonics
- Acronym
- 16 ISCMP
- Dates
- 29 Aug - 3 Sep 2010
- Place
- Varna (Bulgaria)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42053651
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CAPACITORS; CAPACITY; CRYSTAL DEFECTS; ELECTRIC POTENTIAL; HAFNIUM COMPOUNDS; IRRADIATION; LEAKAGE CURRENT; MICROWAVE RADIATION; MODIFICATIONS; STABILITY; TANTALATES; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0273-0400 K
- Descriptors DEC
- CRYSTAL STRUCTURE; CURRENTS; ELECTRIC CURRENTS; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; EQUIPMENT; OXYGEN COMPOUNDS; RADIATIONS; REFRACTORY METAL COMPOUNDS; TANTALUM COMPOUNDS; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS