Published April 2006 | Version v1
Journal article

Proton microbeam irradiation effects on PtBA polymer

  • 1. Department of Physics, B.J.B. Junior College, Bhubaneswar (India)
  • 2. Institute of Physics, Sachivalaya Marg, Bhubaneswar (India)
  • 3. Louisiana Accelerator Centre, LA (United States)
  • 4. Advance Photon Source, Argone National Laboratory, Argone, IL (United States)
  • 5. Department of Physics, University at Albany, Albany, NW (United States)
  • 6. DCMP and MS, Tata Institute of Fundamental Research, Mumbai (India)

Description

Proton beam lithography has made it possible to make various types of 3D-structures in polymers. Usually PMMA, SU-8, PS polymers have been used as resist materials for lithographic purpose. Microbeam irradiation effects on poly-tert-butyl-acrylate (PtBA) polymer using 2.0 MeV proton microbeam are reported. Preliminary results on pattern formation on PtBA are carried out as a function of fluence. After writing the pattern, a thin layer of Ge is deposited. Distribution of Ge in pristine and ion beam patterned surface of PtBA polymer is studied using the optical and secondary electron microscopic experimental methods. (author)

Additional details

Publishing Information

Journal Title
Bulletin of Materials Science
Journal Volume
29
Journal Issue
2
Journal Page Range
p. 101-105
CODEN
BUMSDW

Optional Information

Notes
27 refs., 4 figs.