Published 1985 | Version v1
Report

An electron beam-heater with a broad-area plasma cathode

  • 1. AN SSSR, Tomsk. Inst. Sil'notochnoj Ehlektroniki

Description

An electron-beam heater with a broad-area plasma cathode was designed for thermal treatment of large surfaces in vacuum. Using the plasma electron source of broad cross-section beams instead of a hot-cathode gun generating thin scanning beams allows simultaneous heating all the surface as well as lengthening the service life and raising the reliability of the heater. A broad-area emitting plasma surface is produced in a special electrode cavity by injection into it, through a small hole, of charged particles from a reflex discharge with cold electrodes. Such a principle of design of the plasma cathode allows to obtain an electron beam of the required current density in the pressure range of 10-2 to 1 Pa. The heater can be operated with He, Ar, air and other gases. Using a multiaperture accelerating system comprising emitting and accelerating electrodes, an electron beam up to 150 mm in diameter with an energy up to 15 keV, a current up to 0.5 A, and a nonuniformity of the cross-sectional distribution of the current density not more than +- 6% on the area of 100 cm2 could be generated. The efficiency of the heater at the accelerating voltage of 11 to 13 kV equals to about 90%. (author)

Additional details

Publishing Information

Imprint Title
Energy pulse modification of semiconductors and related materials
Imprint Pagination
386 p.
Journal Page Range
p. 226-230.
Report number
ZfK--555

Conference

Title
Conference on energy pulse modification of semiconductors and related materials.
Dates
25-28 Sep 1984.
Place
Dresden (German Democratic Republic).

INIS

Country of Publication
German Democratic Republic
Country of Input or Organization
German Democratic Republic
INIS RN
17052950
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANNEALING; BEAM-PLASMA SYSTEMS; DOPED MATERIALS; ELECTRON BEAMS; GALLIUM ARSENIDES; HEATERS; PLASMA HEATING; SILICON
Descriptors DEC
ARSENIC COMPOUNDS; ARSENIDES; BEAMS; ELEMENTS; GALLIUM COMPOUNDS; HEAT TREATMENTS; HEATING; LEPTON BEAMS; MATERIALS; PARTICLE BEAMS; SEMIMETALS