Nanoparticle layer deposition for highly controlled multilayer formation based on high-coverage monolayers of nanoparticles
Description
This paper establishes a strategy for chemical deposition of functionalized nanoparticles onto solid substrates in a layer-by-layer process based on self-limiting surface chemical reactions leading to complete monolayer formation within the multilayer system without any additional intermediate layers — nanoparticle layer deposition (NPLD). This approach is fundamentally different from previously established traditional layer-by-layer deposition techniques and is conceptually more similar to well-known atomic and molecular layer deposition processes. The NPLD approach uses efficient chemical functionalization of the solid substrate material and complementary functionalization of nanoparticles to produce a nearly 100% coverage of these nanoparticles with the use of "click chemistry". Following this initial deposition, a second complete monolayer of nanoparticles is deposited using a copper-catalyzed "click reaction" with the azide-terminated silica nanoparticles of a different size. This layer-by-layer growth is demonstrated to produce stable covalently-bound multilayers of nearly perfect structure over macroscopic solid substrates. The formation of stable covalent bonds is confirmed spectroscopically and the stability of the multilayers produced is tested by sonication in a variety of common solvents. The 1-, 2- and 3-layer structures are interrogated by electron microscopy and atomic force microscopy and the thickness of the multilayers formed is fully consistent with that expected for highly efficient monolayer formation with each cycle of growth. This approach can be extended to include a variety of materials deposited in a predesigned sequence on different substrates with a highly conformal filling. - Highlights: • We investigate the formation of high-coverage monolayers of nanoparticles. • We use "click chemistry" to form these monolayers. • We form multiple layers based on the same strategy. • We confirm the formation of covalent bonds spectroscopically for up to 3 layers. • We confirm that chemical attachment, not self-assembly, drives the process.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2015.11.082Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2015.11.082;
- PII
- S0040-6090(15)01239-0;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 598
- Journal Page Range
- p. 16-24
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48020735
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; AZIDES; CHEMICAL BONDS; CHEMICAL REACTIONS; COPPER; COVALENCE; DEPOSITION; LAYERS; NANOPARTICLES; PHASE STABILITY; SCANNING ELECTRON MICROSCOPY; SILICA; SOLVENTS; SUBSTRATES; SURFACES
- Descriptors DEC
- ELECTRON MICROSCOPY; ELEMENTS; METALS; MICROSCOPY; MINERALS; NITROGEN COMPOUNDS; OXIDE MINERALS; PARTICLES; STABILITY; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.