Published January 1, 2016 | Version v1
Journal article

Nanoparticle layer deposition for highly controlled multilayer formation based on high-coverage monolayers of nanoparticles

Description

This paper establishes a strategy for chemical deposition of functionalized nanoparticles onto solid substrates in a layer-by-layer process based on self-limiting surface chemical reactions leading to complete monolayer formation within the multilayer system without any additional intermediate layers — nanoparticle layer deposition (NPLD). This approach is fundamentally different from previously established traditional layer-by-layer deposition techniques and is conceptually more similar to well-known atomic and molecular layer deposition processes. The NPLD approach uses efficient chemical functionalization of the solid substrate material and complementary functionalization of nanoparticles to produce a nearly 100% coverage of these nanoparticles with the use of "click chemistry". Following this initial deposition, a second complete monolayer of nanoparticles is deposited using a copper-catalyzed "click reaction" with the azide-terminated silica nanoparticles of a different size. This layer-by-layer growth is demonstrated to produce stable covalently-bound multilayers of nearly perfect structure over macroscopic solid substrates. The formation of stable covalent bonds is confirmed spectroscopically and the stability of the multilayers produced is tested by sonication in a variety of common solvents. The 1-, 2- and 3-layer structures are interrogated by electron microscopy and atomic force microscopy and the thickness of the multilayers formed is fully consistent with that expected for highly efficient monolayer formation with each cycle of growth. This approach can be extended to include a variety of materials deposited in a predesigned sequence on different substrates with a highly conformal filling. - Highlights: • We investigate the formation of high-coverage monolayers of nanoparticles. • We use "click chemistry" to form these monolayers. • We form multiple layers based on the same strategy. • We confirm the formation of covalent bonds spectroscopically for up to 3 layers. • We confirm that chemical attachment, not self-assembly, drives the process.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2015.11.082

Additional details

Identifiers

DOI
10.1016/j.tsf.2015.11.082;
PII
S0040-6090(15)01239-0;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
598
Journal Page Range
p. 16-24
ISSN
0040-6090
CODEN
THSFAP

INIS

Optional Information

Copyright
Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.