Simulation of penetration range distribution of ion beam with low energy implanted in colored cotton seeds

The depth and density distribution of 20 keV Ti+ implanted into colored cotton seeds is simulated by the Monte Carlo method. The energy loss of incident ions due to nuclear scattering is calculated by using binary collision approximation, and the electronic energy loss is calculated by Lindhard-Scharff formulation. On the basis of some theoretical considerations of the target material, the most probable depth of 20 keV Ti+ implanted into colored cotton seeds is calculated to be 6.66 μm, which agrees with experimental results. This indicates that the model is appropriate to calculate the depth and density distribution of the low energy ions implanted in plant seeds. (authors)