Sputtering yield. Chapter 4

The theoretical background for evaluation of the sputtering yield is described. Emphasis is given on basic processes that govern the sputtering yield. In section 2 the sputtering yield of monatomic solids at normal incidences is described. Here it is pointed out that the sputtering yield of a given combination of incident and target elements can be predicted with a reasonable accuracy using a semiempirical equation. In section 3 the sputtering yield for monatomic solids for glancing incidence is treated and an empirical equation is also presented. In section 4 the sputtering yield of multi-component systems is dealt with and it is pointed out that understanding of the phenomena is still premature. Finally the angular distribution of ejected particles is discussed in section 5. 110 refs.; 25 figs.; 4 tabs