Published August 1991 | Version v1
Journal article Metadata-only

Phase composition of tantalum thin oxygen-containing films

Creators

Description

Phase composition of thin (20-60 nm) films produced by tantalum sputtering in the triode system in argon-oxygen mixture at different partial oxygen pressures is studied. The following phase sequence is abserved in thin tantalum films: bcc (α-Ta) - hexagonal (Ta2O) - fcc (TaO)

Additional details

Additional titles

Original title (Russian)
Фазовый состав тонких кислородсодержащих пленок тантала

Publishing Information

Journal Title
Izvestiya Akademii Nauk SSSR, Neorganicheskie Materialy
Journal Volume
27
Journal Issue
8
Journal Page Range
p. 1771-1772.
ISSN
0002-337X
CODEN
IVNMAW

INIS

Country of Publication
Russian Federation
Country of Input or Organization
Russian Federation
INIS RN
24018343
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
OXYGEN ADDITIONS; PARTIAL PRESSURE; PHASE STUDIES; SPUTTERING; TANTALUM; THIN FILMS
Descriptors DEC
ELEMENTS; FILMS; METALS; PHYSICAL PROPERTIES; THERMODYNAMIC PROPERTIES; TRANSITION ELEMENTS