Published 1985 | Version v1
Book Metadata-only

The use of optical emission spectroscopy for process control in triode ion plating with ZrN

Creators

  • 1. Helsinki Univ. of Technology, Espoo (Finland). Lab. of Metal Working and Heat Treatment

Description

In this work process control in triode ion plating with Optical Emission Spectroscopy is studied. The stoichiometry of the coating is determined from the relative intensities of the emission lines. Changes in the evaporation rate and the gas flow can be detected from emission line intensities. The results show clearly the usefulness of emission spectroscopy in process and discharge control. (author)

Additional details

Publishing Information

Publisher
CEP Consultants Ltd.
Imprint Place
Edinburgh (UK)
Imprint Title
IPAT 85
Imprint Pagination
507 p.
Journal Page Range
p. 83-86.

Conference

Title
5. international conference.
Acronym
Ion and plasma assisted techniques
Dates
May 1985.
Place
Munich (Germany, F.R.).

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
18058754
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHEMICAL COMPOSITION; CLOSED-LOOP CONTROL; EMISSION SPECTROSCOPY; EVAPORATION; PLATING; THIN FILMS; TRIODE TUBES; ZIRCONIUM NITRIDES
Descriptors DEC
CONTROL; DEPOSITION; ELECTRON TUBES; FILMS; NITRIDES; NITROGEN COMPOUNDS; PHASE TRANSFORMATIONS; SPECTROSCOPY; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; ZIRCONIUM COMPOUNDS

Optional Information

Notes
Imprint:Price Pound66.00.