Published March 1, 2011 | Version v1
Journal article Metadata-only

Growth, structure and properties of sputtered niobium oxide thin films

Creators

Description

Niobium oxide (NbOx) films were deposited by pulsed dc magnetron sputtering at different total gas pressures and oxygen flow rates. Various film properties were characterized by X-ray photoelectron spectroscopy, atomic force microscopy, variable angle spectroscopic ellipsometry and four point probe. It was found that oxygen flow rates required for preparing NbO, NbO2 and Nb2O5 at a constant total pressure of 0.93 Pa were approximately 2, 4 and > 6 sccm, respectively. The results showed that the film properties, specifically composition can be significantly changed by the total gas pressure and the oxygen flow rate.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2010.12.036

Additional details

Identifiers

DOI
10.1016/j.tsf.2010.12.036;
PII
S0040-6090(10)01666-4;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
519
Journal Issue
10
Journal Page Range
p. 3068-3073
ISSN
0040-6090
CODEN
THSFAP

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42067305
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; FLOW RATE; MAGNETRONS; MORPHOLOGY; NIOBIUM OXIDES; OPTICAL PROPERTIES; OXYGEN; PRESSURE RANGE MILLI PA; SPUTTERING; SURFACES; THIN FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY
Descriptors DEC
CHALCOGENIDES; ELECTRON SPECTROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; MEASURING METHODS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NIOBIUM COMPOUNDS; NONMETALS; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL PROPERTIES; PRESSURE RANGE; REFRACTORY METAL COMPOUNDS; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.