Published November 28, 2007 | Version v1
Journal article

Evolution of strain and composition during growth and capping of Ge quantum dots with different morphologies

  • 1. Institut de Ciencia de Materials de Barcelona-CSIC, Esfera UAB, 08193 Bellaterra (Spain)

Description

We follow the growth of islands with different shapes by monitoring the strain relaxation by reflection high energy electron diffraction (RHEED). Comparing a bimodal ensemble of pyramids and domes with a monomodal distribution of C-induced domes, we observe different relaxation pathways and a growth mode change from Stranski-Krastanow to Volmer-Weber. We also study the changes induced by the capping process with Si. Small strains in thin cap layers are revealed by spectroscopic ellipsometry. Raman spectroscopy is employed to probe the built-in strain and silicon intermixing in different types of islands, evidencing that smaller islands are enriched in Si and effectively recompressed, whereas bigger relaxed dots remain substantially unaffected

Additional details

Identifiers

DOI
10.1088/0957-4484/18/47/475401;
PII
S0957-4484(07)55032-4;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
18
Journal Issue
47
Journal Page Range
p. 475401
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39040371
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CRYSTAL GROWTH; ELECTRON DIFFRACTION; ELLIPSOMETRY; GERMANIUM; LAYERS; MORPHOLOGY; QUANTUM DOTS; RAMAN SPECTROSCOPY; SILICON; STRAINS
Descriptors DEC
COHERENT SCATTERING; DIFFRACTION; ELEMENTS; LASER SPECTROSCOPY; MEASURING METHODS; METALS; NANOSTRUCTURES; SCATTERING; SEMIMETALS; SPECTROSCOPY