Evolution of strain and composition during growth and capping of Ge quantum dots with different morphologies
Creators
- 1. Institut de Ciencia de Materials de Barcelona-CSIC, Esfera UAB, 08193 Bellaterra (Spain)
Description
We follow the growth of islands with different shapes by monitoring the strain relaxation by reflection high energy electron diffraction (RHEED). Comparing a bimodal ensemble of pyramids and domes with a monomodal distribution of C-induced domes, we observe different relaxation pathways and a growth mode change from Stranski-Krastanow to Volmer-Weber. We also study the changes induced by the capping process with Si. Small strains in thin cap layers are revealed by spectroscopic ellipsometry. Raman spectroscopy is employed to probe the built-in strain and silicon intermixing in different types of islands, evidencing that smaller islands are enriched in Si and effectively recompressed, whereas bigger relaxed dots remain substantially unaffected
Additional details
Identifiers
- DOI
- 10.1088/0957-4484/18/47/475401;
- PII
- S0957-4484(07)55032-4;
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 18
- Journal Issue
- 47
- Journal Page Range
- p. 475401
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39040371
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CRYSTAL GROWTH; ELECTRON DIFFRACTION; ELLIPSOMETRY; GERMANIUM; LAYERS; MORPHOLOGY; QUANTUM DOTS; RAMAN SPECTROSCOPY; SILICON; STRAINS
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; ELEMENTS; LASER SPECTROSCOPY; MEASURING METHODS; METALS; NANOSTRUCTURES; SCATTERING; SEMIMETALS; SPECTROSCOPY