Published April 1981
| Version v1
Journal article
Preparation of titanium carbide films by reactive sputtering
Creators
- 1. Hokkaido Univ., Sapporo (Japan). Faculty of Engineering
Description
no abstract available
Additional details
Publishing Information
- Journal Title
- Shinku
- Journal Volume
- 24
- Journal Issue
- 4
- Series
- Shinku.
- Journal Page Range
- 265-268
- ISSN
- 0559-8516
Conference
- Title
- 21. vacuum symposium.
- Dates
- Nov 1980.
- Place
- Kyoto (Japan).
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 14725966
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference, No Abstract
- Descriptors DEI
- COATINGS; FILMS; GRAPHITE; HIGH VACUUM; METHANE; PHOTOELECTRON SPECTROSCOPY; PRESSURE DEPENDENCE; QUANTITY RATIO; RF SYSTEMS; SPUTTERING; TITANIUM; TITANIUM CARBIDES
- Descriptors DEC
- ALKANES; CARBIDES; CARBON; CARBON COMPOUNDS; ELECTRON SPECTROSCOPY; ELEMENTS; HYDROCARBONS; METALS; NONMETALS; ORGANIC COMPOUNDS; SPECTROSCOPY; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Notes
- Published in summary form only.