Modeling of metal–oxide semiconductor: Analytical bond-order potential for cupric oxide
Creators
- 1. College of Applied Science, Taiyuan University of Science and Technology, Taiyuan 030024 (China)
- 2. College of Materials Science and Engineering, Taiyuan University of Science and Technology, Taiyuan 030024 (China)
Description
Atomistic potentials for cupric element and cupric oxide are derived based on the analytical bond-order scheme that was presented by Brenner [Brenner D W, "Erratum: Empirical potential for hydrocarbons for use in simulating the chemical vapor deposition of diamond films", Phys. Rev. B 1992, 46 1948]. In this paper, for the pure cupric element, the energy and structural parameters for several bulk phases as well as dimmer structure are well reproduced. The reference data are taken from our density functional theory calculations and the available experiments. The model potential also provides a good description of the bulk properties of various solid structures of cupric oxide compound structures, including cohesive energies, lattice parameters, and elastic constants. (condensed matter: electronic structure, electrical, magnetic, and optical properties)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-1056/23/4/047103Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics. B
- Journal Volume
- 23
- Journal Issue
- 4
- Journal Page Range
- [5 p.]
- ISSN
- 1674-1056
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46081950
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COPPER OXIDES; DENSITY FUNCTIONAL METHOD; DIAMONDS; HYDROCARBONS; LATTICE PARAMETERS; POTENTIALS; SEMICONDUCTOR MATERIALS; SIMULATION; SOLIDS
- Descriptors DEC
- CALCULATION METHODS; CARBON; CHALCOGENIDES; CHEMICAL COATING; COPPER COMPOUNDS; DEPOSITION; ELEMENTS; MATERIALS; MINERALS; NONMETALS; ORGANIC COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; VARIATIONAL METHODS