Published May 28, 2012 | Version v1
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Characterization of test structures for e-beam lithography for estimation of proximity exposure parameters

  • 1. Institute of Informatics, Slovak Academy of Sciences, SK-842 36 Bratislava (Slovakia)

Description

The EBDW lithography experiments have been carried out on the ZBA 10 (30 keV mode, thermal emission cathode), ZBA 21 (20 keV) and ZBA 23 (20 and 40 keV modes, LaB6 cathode) variable shaped e-beam pattern generators. In order to obtain the necessary information needed for the optimization of the exposure control PSF, several lithography tests were used, some of which will be shortly described here and some results taken from these experiments will be presented. (authors)

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Part of:
Proceedings of the 18th International Conference on Applied Physics of Condensed Matter

Additional details

Publishing Information

Publisher
Slovak University of Technology
Imprint Place
Bratislava (Slovakia)
ISBN
978-80-227-3720-3
Imprint Title
Proceedings of the 18th International Conference on Applied Physics of Condensed Matter
Imprint Pagination
369 p.
Journal Page Range
p. 141-144
Report number
INIS-SK--2017-027

Conference

Title
18. International Conference on Applied Physics of Condensed Matter
Acronym
APCOM 2012
Dates
20-22 Jun 2012
Place
Strbske Pleso (Slovakia)

Optional Information

Contract/Grant/Project number
Grant VEGA- 2/0021/12; project Crisis ITMS Nr. 26240220060
Notes
5 figs., 4 refs. Imprint:Published also on CDROM 32 MBytes in PDF format