Published June 2019 | Version v1
Journal article

Direct p-doping of Li-TFSI for efficient hole injection: Role of polaronic level in molecular doping

  • 1. van der Waals Materials Research Center, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722 (Korea, Republic of)
  • 2. Institute of Physics and Applied Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722 (Korea, Republic of)
  • 3. Department of Physics, Yonsei University, 1 Yonseidae-gil, Wonju-si, Gangwon-do 26493 (Korea, Republic of)
  • 4. Department of Physics, Kangwon National University, 1 Gangwondaehak-gil, Chuncheon-si, Gangwon-do 24341 (Korea, Republic of)

Description

Bis(trifluoromethane)sulfonimide lithium salt (Li-TFSI) has been popularly employed as an efficient p-dopant that increases the conductivity of a hole transport layer (HTL) in perovskite solar cells and dye-sensitized solar cells. However, the working mechanism of the Li-TFSI dopant is a long-standing question. The hygroscopicity of Li-TFSI makes it difficult to isolate the exact doping mechanism. In this study, we unveil the role of Li-TFSI in the p-doping to the N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine (NPB) HTL. A series of systematic in situ measurements using ultraviolet and inverse photoelectron spectroscopy reveal that electron transfer from NPB to Li-TFSI occurs due to the lower-lying negative polaronic level of Li-TFSI rather than the positive polaronic level of NPB. The hole injection barrier between NPB and indium tin oxide is significantly reduced with Li-TFSI doping, enhancing the device performance of hole-only devices and organic light-emitting diodes dramatically. With excessive dopants, however, the agglomerative property of Li-TFSI became dominant, decreasing the doping efficiency. These results provide robust guidelines for developing an efficient doping method for a molecular system with high conductivity.

Additional details

Identifiers

DOI
10.1016/j.apsusc.2019.02.248;
PII
S0169433219306051;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
480
Journal Page Range
p. 565-571
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2019 Elsevier B.V. All rights reserved.