Published December 4, 2013
| Version v1
Journal article
Ab initio studies of early stages of AlN and GaN growth on 4H-SiC
- 1. Institute of Experimental Physics, University of Wroclaw, PL-50-204 Wroclaw (Poland)
- 2. Institute of Physics, University of Rzeszow, PL -35-959 Rzeszow, Poland and Faculty of Physics, University of Warsaw, PL-00-681 Warsaw (Poland)
- 3. Faculty of Physics, University of Warsaw, PL-00-681 Warsaw (Poland)
Description
Processes of aluminum and gallium adsorption on Si- and C-terminated 4H-SiC(0001) surfaces have been studied within the DFT framework. Al and Ga coverages ranging from a submonolayer to one monolayer have been considered. The results show that Al binds more strongly to both surfaces than Ga and the binding of both metals is stronger to the C-terminated than to Si-terminated surface of SiC. The lateral lattice sites occupied by Al and Ga atoms at one monolayer are different and it is due to a different charge transfer from metal to the substrate
Additional details
Identifiers
- DOI
- 10.1063/1.4848282;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 1566
- Journal Issue
- 1
- Journal Page Range
- p. 55-56
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 31. international conference on the physics of semiconductors
- Acronym
- ICPS 2012
- Dates
- 29 Jul - 3 Aug 2012
- Place
- Zurich (Switzerland)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45083156
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ADSORPTION; ALUMINIUM; ALUMINIUM NITRIDES; GALLIUM; GALLIUM NITRIDES; SILICON CARBIDES; SUBSTRATES; SURFACES
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CARBIDES; CARBON COMPOUNDS; ELEMENTS; GALLIUM COMPOUNDS; METALS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SILICON COMPOUNDS; SORPTION
Optional Information
- Notes
- (c) 2013 AIP Publishing LLC