Published December 4, 2013 | Version v1
Journal article

Ab initio studies of early stages of AlN and GaN growth on 4H-SiC

  • 1. Institute of Experimental Physics, University of Wroclaw, PL-50-204 Wroclaw (Poland)
  • 2. Institute of Physics, University of Rzeszow, PL -35-959 Rzeszow, Poland and Faculty of Physics, University of Warsaw, PL-00-681 Warsaw (Poland)
  • 3. Faculty of Physics, University of Warsaw, PL-00-681 Warsaw (Poland)

Description

Processes of aluminum and gallium adsorption on Si- and C-terminated 4H-SiC(0001) surfaces have been studied within the DFT framework. Al and Ga coverages ranging from a submonolayer to one monolayer have been considered. The results show that Al binds more strongly to both surfaces than Ga and the binding of both metals is stronger to the C-terminated than to Si-terminated surface of SiC. The lateral lattice sites occupied by Al and Ga atoms at one monolayer are different and it is due to a different charge transfer from metal to the substrate

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
1566
Journal Issue
1
Journal Page Range
p. 55-56
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
31. international conference on the physics of semiconductors
Acronym
ICPS 2012
Dates
29 Jul - 3 Aug 2012
Place
Zurich (Switzerland)

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45083156
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ADSORPTION; ALUMINIUM; ALUMINIUM NITRIDES; GALLIUM; GALLIUM NITRIDES; SILICON CARBIDES; SUBSTRATES; SURFACES
Descriptors DEC
ALUMINIUM COMPOUNDS; CARBIDES; CARBON COMPOUNDS; ELEMENTS; GALLIUM COMPOUNDS; METALS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SILICON COMPOUNDS; SORPTION

Optional Information

Notes
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