Numerical calculation and analysis of proton radiation effects on CCD based on Monte Carlo method
Creators
- 1. State Key Laboratory of Intense Pulsed Irradiation Simulation and Effect, Northwest Institute of Nuclear Technology, Xi'an (China)
- 2. School of Materials Science and Engineering, Xiangtan University, Xiangtan (China)
Description
Numerical calculation and analysis of proton radiation effects on CCD based on Monte Carlo method were developed by Geant4, a 3-D Monte Carlo code. The projected ranges and Bragg peaks of protons in Si and SiO2 were calculated and the results were in good agreement with the reference data. The ionizing energy losses of protons in SiO2 and non-ionizing energy losses in Si were also calculated and the results were in good agreement with the reference data. The detailed geometry model of the pixel of CCD was established. The ionizing energy deposition and non-ionizing energy deposition in the sensitive region of CCD caused by protons at different energy were calculated. The proton radiation effects on CCD were analyzed by combining experiment results and the numerical calculation. The achievements of this paper provide a basis of theories for CCD radiation degradation mechanisms and radiation damage evaluation study. (authors)
Additional details
Identifiers
Publishing Information
- Journal Title
- High Power Laser and Particle Beams
- Journal Volume
- 30
- Journal Issue
- 4
- Journal Page Range
- [6 p.]
- ISSN
- 1001-4322
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 55052823
- Subject category
- S73: NUCLEAR PHYSICS AND RADIATION PHYSICS; S97: MATHEMATICAL METHODS AND COMPUTING;
- Descriptors DEI
- BRAGG CURVE; CHARGE-COUPLED DEVICES; ENERGY ABSORPTION; ENERGY LOSSES; EVALUATION; EXPERIMENT RESULTS; GEOMETRY; MONTE CARLO METHOD; PROTONS; RADIATION EFFECTS; SILICA; SILICON OXIDES
- Descriptors DEC
- ABSORPTION; BARYONS; CALCULATION METHODS; CHALCOGENIDES; DIAGRAMS; ELEMENTARY PARTICLES; FERMIONS; HADRONS; INFORMATION; LOSSES; MATHEMATICS; MINERALS; NUCLEONS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES; SILICON COMPOUNDS; SORPTION
Optional Information
- Notes
- 11 figs., 16 refs.; http://dx.doi.org/10.11884/HPLPB201830.170248