Published March 1977
| Version v1
Journal article
Field ion microscopic investigations of osmium
Creators
- 1. Technische Hochschule, Graz (Austria). Inst. fuer Angewandte Physik und Lichttechnik
Description
Very pure osmium is investigated in the field of ion microscopy by using helium as imaging gas at 21 and 78 K in respect to bond order, crystal defects and influence of additional gases (Ne,H2,O2,N2) in low concentrations. (orig.)
Abstract (German)
Sehr reines Osmium ist feldionenmikroskopisch unter Verwendung von Helium als Abbildungsgas bei 21 und 78 K im Hinblick auf die Bindungsordnung, Gitterstoerungen und den Einfluss geringer Fremdgaszusaetze (Ne,H2,O2,N2) naeher untersucht worden. (orig.)Additional details
Additional titles
- Original title (German)
- Feldionenmikroskopische Untersuchungen an Osmium
Publishing Information
- Journal Title
- Z. Metallkd.
- Journal Volume
- 68
- Journal Issue
- 3
- Series
- Z. Metallkd.
- Journal Page Range
- 173-179
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 8326150
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ADSORPTION; DISLOCATIONS; HELIUM; ION MICROSCOPY; LOW TEMPERATURE; NEON; NITROGEN; OSMIUM; OXYGEN; VERY LOW TEMPERATURE
- Descriptors DEC
- CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELEMENTS; LINE DEFECTS; METALS; MICROSCOPY; NONMETALS; PLATINUM METALS; RARE GASES; TRANSITION ELEMENTS
Optional Information
- Notes
- 12 figs.; 16 refs.