Published March 2007 | Version v1
Journal article

Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector

  • 1. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800 (China)
  • 2. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800 (China) and Graduate School of the Chinese Academy of Sciences, Beijing 100039 (China)

Description

HfO2 single layers, 800 nm high-reflective (HR) coating, and 1064 nm HR coating were prepared by electron-beam evaporation. The laser-induced damage thresholds (LIDTs) and damage morphologies of these samples were investigated with single-pulse femtosecond and nanosecond lasers. It is found that the LIDT of the HfO2 single layer is higher than the HfO2-SiO2 HR coating in the femtosecond regime, while the situation is opposite in the nanosecond regime. Different damage mechanisms are applied to study this phenomenon. Damage morphologies of all samples due to different laser irradiations are displayed

Additional details

Identifiers

Publishing Information

Journal Title
Journal of the Optical Society of America. Part B, Optical Physics
Journal Volume
24
Journal Issue
3
Journal Page Range
p. 538-543
ISSN
0740-3224
CODEN
JOBPDE

Optional Information

Notes
(c) 2007 Optical Society of America