Oxidation of the (110) face of molybdenum monocrystal

Oxidation of the Mo face (110) has been studied by diffraction of slow electrons and contact potential difference in vacuum less than 10-10 torr in the process of isothermal oxygen adsorption within the range 25-1400 deg C; the heating of the obtained structures has been investigated. A two-dimensional oxide film of MoO with the face (100) parallel to the substrate plane is formed within the range Tsub(ads) 550-750 and 10O0-1300 deg C. At intermediate temperature 750-1000 deg C it is possible to obtain simultaneously faceted and non-faceted films of MoO3 oriented with the face (111) parallel to the substrate plane. The crystals of the oxide faceted film are triangle pyramids whose base is the face (111) of MoO3 and lateral faces-the face (100). The two-dimensional MoO2 film with the face (100) parallel to the substrate plane is obtained at Tsub(ads) 700 deg C and upon heating the oxygen films, obtained at Tsub(ads) 325-117O deg C, within the range Tsub(int) 1120-1180 deg C