Laser spraying of materials and formation of functional coatings on dielectrics

A device has been created for the implementation of vacuum laser sputtering of materials such as Ti, Mo, Ta, Zr, Si, Si_nMn_k and other alloys. Targets in the form of rotating discs are processed in a vacuum of the order of 10^-3 Pa by a pulsed laser with a power of 200 mJ at a pulse frequency of up to 15 Hz. The coatings of these materials with a thickness from 30-50 nm to 1 μm on pre-chemically cleaned K-8 glass, ST-50-1 glass, monocrystalline silicon with an oxide layer and mica have been studied. To form topological patterns on coatings with an accuracy of 20-30 microns, laser processing and electrochemical exposure (anodic oxidation with a voltage of up to 200 V) were also used. The possibility of creating colored protective and decorative coatings with a pattern based on two-layer coatings of the Zr-ZrO₂ type and heat-sensitive coatings based on manganese silicide is shown. (authors)