Effects of oxygen plasma treatment on the dielectric properties of Ba0.7Sr0.3TiO3 thin films
Creators
- 1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, No. 4, Section 2, North Jianshe Road, Chengdu 610054 (China)
Description
Barium strontium titanate (BST) films prepared by RF magnetron sputtering were processed in an O2-plasma treatment system. Experiment results indicate that the leakage current and dielectric loss of the films were effectively reduced after plasma treatment. The possible mechanism may be attributed to the passivation of oxygen vacancies, which act as electric conduction paths of leakage current. The effects of the time, power and O2-plasma pressure of oxygen plasma treatment on the dielectric properties of BST thin films were further investigated and optimized. Compared to as-deposited films, the BST films treated in oxygen plasma for 5 min, 200 W and 3 Torr demonstrated reduced loss tangent around 0.7% and leakage current density of 7.96 x 10-9 A/cm2. However, it was also found that excessive plasma treatment would affect the dielectric properties of BST films negatively.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2010.10.121Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2010.10.121;
- PII
- S0169-4332(10)01487-X;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 257
- Journal Issue
- 7
- Journal Page Range
- p. 3088-3091
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44024831
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BARIUM COMPOUNDS; DENSITY; DIELECTRIC MATERIALS; DIELECTRIC PROPERTIES; LEAKAGE CURRENT; MAGNETRONS; OXYGEN; PLASMA; PLASMA PRESSURE; SPUTTERING; STRONTIUM COMPOUNDS; THIN FILMS; TITANATES
- Descriptors DEC
- ALKALINE EARTH METAL COMPOUNDS; CURRENTS; ELECTRIC CURRENTS; ELECTRICAL PROPERTIES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; MATERIALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.