Published January 15, 2011 | Version v1
Journal article

Effects of oxygen plasma treatment on the dielectric properties of Ba0.7Sr0.3TiO3 thin films

  • 1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, No. 4, Section 2, North Jianshe Road, Chengdu 610054 (China)

Description

Barium strontium titanate (BST) films prepared by RF magnetron sputtering were processed in an O2-plasma treatment system. Experiment results indicate that the leakage current and dielectric loss of the films were effectively reduced after plasma treatment. The possible mechanism may be attributed to the passivation of oxygen vacancies, which act as electric conduction paths of leakage current. The effects of the time, power and O2-plasma pressure of oxygen plasma treatment on the dielectric properties of BST thin films were further investigated and optimized. Compared to as-deposited films, the BST films treated in oxygen plasma for 5 min, 200 W and 3 Torr demonstrated reduced loss tangent around 0.7% and leakage current density of 7.96 x 10-9 A/cm2. However, it was also found that excessive plasma treatment would affect the dielectric properties of BST films negatively.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2010.10.121

Additional details

Identifiers

DOI
10.1016/j.apsusc.2010.10.121;
PII
S0169-4332(10)01487-X;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
257
Journal Issue
7
Journal Page Range
p. 3088-3091
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.