Published October 15, 2010 | Version v1
Journal article

Interface atomic structure of LaCuOSe:Mg epitaxial thin film and MgO substrate

  • 1. Institute of Engineering Innovation, University of Tokyo, Yayoi 2-11-16, Bunkyo-ku, Tokyo 113-8656 (Japan)
  • 2. ERATO-SORST, Japan Science and Technology Agency (Japan)
  • 3. Frontier Research Center, Tokyo Institute of Technology, Yokohama 226-8503 (Japan)
  • 4. Nanostructures Research Laboratory, Japan Fine Ceramics Center, Nagoya 456-8587 (Japan)

Description

In order to understand the growth mechanism of magnesium doped LaCuOSe thin film on MgO, the atomic structure of the interface between the epitaxial thin film and the substrate was investigated. Electron diffraction confirmed the orientation relationship between the film and the substrate as (0 0 1)[1 0 0]LaCuOSe:Mg//(0 0 1)[1 0 0]MgO. High resolution Z-contrast imaging based on the high angle annular dark field scanning transmission electron microscope (HAADF-STEM) technique clearly revealed the alternate stacking of La-O layers and Cu-Se layers, and identified a peculiar stacking sequence of La layers at the interface. With the aid of first principles calculations of the interfacial adhesive energy, it was found that the different La layers at the interface play a key role in stabilizing the interface.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.mseb.2009.12.024

Additional details

Identifiers

DOI
10.1016/j.mseb.2009.12.024;
PII
S0921-5107(09)00549-2;

Publishing Information

Journal Title
Materials Science and Engineering. B, Solid-State Materials for Advanced Technology
Journal Volume
173
Journal Issue
1-3
Journal Page Range
p. 229-233
ISSN
0921-5107
CODEN
MSBTEK

Conference

Title
3. international conference on science and technology of advanced ceramics
Acronym
STAC-3
Dates
16-18 Jun 2009
Place
Yokohama (Japan)

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.