Novel effects of weak magnetic fields on post-implantation damage in semiconductors and superconducting ceramics

Novel experimentally verifiable and theoretically explained effects of weak static magnetic fields (WSMFs) acting during ion implantation of semiconductors and superconducting ceramics (SCC) at 300 K, moderate ion energies (e.g. 200-400 keV) and low dosage (e.g. 1011-1013 m-2) on the post-implantation radiation damage (PIRD) and material parameters are discussed. The WSMF of strength of H∼1 kOe reduces, as previously reported, the PIRD in Hg08Cd02Te and InSb by factors of 2 and 1.54, respectively, and can increase the PIRD and change material parameters in SCCs. The WSMF effects on the radiation damage is a generic consequence of the kinetic electron-related theory of atomic rate processes in solids which shows that local electron transitions (LETs) in the nanometer vicinity of hopping atoms (defects) influence exponentially defect formation and migration rates. The magnetic field changing the LET number affects exponentially the rates of formation, migration and agglomeration of point defects and thus change the radiation damage. (orig.)