Published February 21, 2014 | Version v1
Journal article

Formation and annealing of boron-oxygen defects in irradiated silicon and silicon-germanium n+–p structures

  • 1. Belarusian State University, Minsk (Belarus)
  • 2. Scientific-Practical Materials Research Centre of NAS of Belarus (Belarus)
  • 3. CERN, Geneva (Switzerland)
  • 4. National Institute of Materials Physics, Magurele (Romania)
  • 5. Leibniz Institute for Crystal Growth, Berlin (Germany)

Description

New findings on the formation and annealing of interstitial boron-interstitial oxygen complex (BiOi) in p-type silicon are presented. Different types of n+−p structures irradiated with electrons and alpha-particles have been used for DLTS and MCTS studies. Electronic excitation essentially changes the formation rate of BiOi. It has been found that the increase of oxygen content slows the BiOi annealing rate down. The activation energy of the BiOi dissociation has been determined and it was found that germanium doping does not change the activation energy

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
1583
Journal Issue
1
Journal Page Range
p. 123-126
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
27. international conference on defects in semiconductors
Acronym
ICDS-2013
Dates
21-26 Jul 2013
Place
Bologna (Italy)

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45084904
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ACTIVATION ENERGY; ALPHA PARTICLES; ANNEALING; BORON; ELECTRONS; GERMANIUM; IRRADIATION; NITROGEN IONS; OXYGEN; OXYGEN COMPLEXES; SILICON
Descriptors DEC
CHARGED PARTICLES; COMPLEXES; ELEMENTARY PARTICLES; ELEMENTS; ENERGY; FERMIONS; HEAT TREATMENTS; IONIZING RADIATIONS; IONS; LEPTONS; METALS; NONMETALS; RADIATIONS; SEMIMETALS

Optional Information

Notes
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