Role of the Lysine as a Complexing Agent in Ge2Sb2Te5 Chemical Mechanical PolishingSlurries
- 1. Graduate School of the Chinese Academy of Sciences, Beijing 100049 (China)
- 2. State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, CAS, Shanghai 200050 (China)
Description
In this work,we investigate the polishing behavior, static dissolution and electrochemical performace of Ge2Sb2Te5 in the presense of lysine as a complexing agent with H2O2 employed as an oxidizer. Electrochemical techniques are used to investigate polishing behavior under static conditions as a function of lysine concentration .The polishing rate of GST increases with lysine concentraion increasing in acidic solutions at pH 5.2. The static dissolution rate shows the same trend. In the presence of lysine, the surface of GST film is smooth. To verify the complexes of the GST and lysine soluble, the Inductively Coupled Plasma is used which demonstrates that complexes with GST and lysine are soluble and the solubleness of Te element is increasing with lysine concentration increasing. In addition, electrochemical investigation indicates that an enhanced polishing rate and static dissolution is due to the Icorr increase varying lysine concentrations. Finally, X-ray photoelectron spectroscope results suggest that the chemical mechanism of lysine as a complexing agent is that lysine has the chemical reaction with GST oxide
Availability note (English)
Available from http://dx.doi.org/10.1016/j.electacta.2014.05.008Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2014.05.008;
- PII
- S0013-4686(14)00975-X;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 135
- Journal Page Range
- p. 101-107
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47007578
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- CHELATING AGENTS; CORROSION; DISSOLUTION; FILMS; HYDROGEN PEROXIDE; LYSINE; OXIDES; OXIDIZERS; POLISHING; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- AMINO ACIDS; CARBOXYLIC ACIDS; CHALCOGENIDES; CHEMICAL REACTIONS; ELECTRON SPECTROSCOPY; HYDROGEN COMPOUNDS; ORGANIC ACIDS; ORGANIC COMPOUNDS; OXYGEN COMPOUNDS; PEROXIDES; PHOTOELECTRON SPECTROSCOPY; SPECTROSCOPY; SURFACE FINISHING
Optional Information
- Copyright
- Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.