X-ray phase analysis of thin films of condensates of transition metal disilicides

For establishing genepal pegularity of the cpystal phase formation process course condensates of Ta, Mo, Co, Cr and Mn disilicides depending on sputtering time and consequent film heat treatment conditions have been investigated. The preliminary substrate heating in all cases constituted 500 K. It has been found that in the process of amorphous phase crystallization obtained in the course of sputtering of tpansition metal maximum permissible silicides the two-phase system arises which consists of amorphous and crystal phases, the crystal phase representing the transition metal disilicide. The additional heat treatment contributes to crystal phase formation Film doping with another silicideforming element can affect the amorphous phase stability