Published November 1983 | Version v1
Journal article

Hot ion doping of p-InSb with sulphur (properties of n-p junctions)

  • 1. Moskovskij Gosudarstvennyj Univ. (USSR). Nauchno-Issledovatel'skij Inst. Mekhaniki

Description

A study was made on n-p junctions, produced by ''hot'' doping with sulphur ions of p-type indium antimonide. The chosen conditions of ion implantation (E=40 keV ion energy, Tsub(irr)=290 deg C irradiation temperature, j=2.0 μA/sm2 ion current denisty, D=3.75-6.25x1014 sm-2 dose interval) provide low degree of crystal disorder. The basic contribution into the current of forward VAC branch of p-n junctions is made by the diffusion component (eta approximately 1.23). The back VAC branch is characterized by low value of back J=5x10-7 A/sm2 current at U=2-4 V and high values of Usub(br)=112 V break down voltage

Additional details

Additional titles

Original title (Russian)
Горячее ионное легирование п-InSb серой (свойства н-п-переходов)

Publishing Information

Journal Title
Fiz. Tekh. Poluprovodn.
Journal Volume
17
Journal Issue
11
Series
Fiz. Tekh. Poluprovodn.
Journal Page Range
1923-1925
ISSN
0015-3222

Optional Information

Notes
For English translation see the journal Soviet Physics - Semiconductors (USA).