Published June 1987 | Version v1
Journal article

Defect formation in artificial diamond under high energy ion implantation

  • 1. AN SSSR, Leningrad. Fiziko-Tekhnicheskij Inst.

Description

Cathodo- and photoluminescence methods were used to investigate centers conditioned with impurity and intrinsic defects introduced to a synthetic diamond with 82 MeV carbon ion implantation. Observed line broadening, weakening of temperature effect on spectral characteristics of centers, peculiarities of these center behaviour during annealing are attributed to, firstly, the presence of a metastable defect structure in synthetic diamond unlike natural one and, secondly, to the decrease of electron-phonon interaction in crystals irradiated with high energy ions

Additional details

Additional titles

Original title (Russian)
Defektoobrazovanie v sinteticheskom almaze pri vysokoehnergetichnoj ionnoj implantatsii

Publishing Information

Journal Title
Fiz. Tekh. Poluprovodn.
Journal Volume
21
Journal Issue
6
Series
Fiz. Tekh. Poluprovodn.
Journal Page Range
1095-1100
ISSN
0015-3222
CODEN
FTPPA