Published June 1987
| Version v1
Journal article
Defect formation in artificial diamond under high energy ion implantation
Creators
- 1. AN SSSR, Leningrad. Fiziko-Tekhnicheskij Inst.
Description
Cathodo- and photoluminescence methods were used to investigate centers conditioned with impurity and intrinsic defects introduced to a synthetic diamond with 82 MeV carbon ion implantation. Observed line broadening, weakening of temperature effect on spectral characteristics of centers, peculiarities of these center behaviour during annealing are attributed to, firstly, the presence of a metastable defect structure in synthetic diamond unlike natural one and, secondly, to the decrease of electron-phonon interaction in crystals irradiated with high energy ions
Additional details
Additional titles
- Original title (Russian)
- Defektoobrazovanie v sinteticheskom almaze pri vysokoehnergetichnoj ionnoj implantatsii
Publishing Information
- Journal Title
- Fiz. Tekh. Poluprovodn.
- Journal Volume
- 21
- Journal Issue
- 6
- Series
- Fiz. Tekh. Poluprovodn.
- Journal Page Range
- 1095-1100
- ISSN
- 0015-3222
- CODEN
- FTPPA
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- USSR
- INIS RN
- 19010149
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANNEALING; CARBON IONS; CATHODOLUMINESCENCE; DIAMONDS; HIGH TEMPERATURE; ION IMPLANTATION; LINE BROADENING; LINE WIDTHS; MEV RANGE 100-1000; MONOCRYSTALS; N CODES; PHOTOLUMINESCENCE; RADIATION DOSES; TIME DEPENDENCE; VERY HIGH TEMPERATURE
- Descriptors DEC
- ATOMIC IONS; CARBON; CHARGED PARTICLES; COMPUTER CODES; CRYSTALS; ELEMENTS; EMISSION; ENERGY RANGE; HEAT TREATMENTS; IONS; LUMINESCENCE; MEV RANGE; MINERALS; NONMETALS; PHOTON EMISSION