Published February 15, 2009 | Version v1
Journal article

Molecular functionalization of tantalum oxide surface towards development of apatite growth

  • 1. Laboratory of Chemistry and Electrochemistry of Surfaces (CES), University of Namur, FUNDP, Rue de Bruxelles 61, B-5000 Namur (Belgium)
  • 2. Research Center in Physics of Matter and Radiation (PMR), University of Namur, FUNDP, Rue de Bruxelles 61, B-5000 Namur (Belgium)

Description

We have studied the apatite growth dynamics on tantalum oxide surfaces. This nucleation is obtained via an organosilane intermediate layer between the apatite and the substrate surface. Four organosilane layers (differing by their terminal functionality) were investigated. Their characterization with atomic force microscopy and other techniques such as X-ray photoelectron spectroscopy (XPS) and wetting measurements highlighted the influence of the organosilane terminal groups on the apatite growth rates. Results revealed that apatite is indeed growing faster on phosphate terminal groups than on the three other groups studied (vinyl, hydroxyl and carboxyl).

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2008.11.022

Additional details

Identifiers

DOI
10.1016/j.apsusc.2008.11.022;
PII
S0169-4332(08)02370-2;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
255
Journal Issue
9
Journal Page Range
p. 4765-4772
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.