Published November 28, 2014 | Version v1
Journal article

Electrochemical deposition of Cu and Nb from pyrrolidinium based ionic liquid

  • 1. Dipartimento di Ingegneria Meccanica, Chimica e dei Materiali Università degli Studi di Cagliari, via Marengo 2, 09123 Cagliari (Italy)
  • 2. Laboratorio Telemicroscopia Industriale, Sardegna Ricerche, Polaris, Parco Tecnologico della Sardegna, Edificio 3, Loc. Piscinamanna, 09010 Pula, CA (Italy)

Description

A study on the electrochemical deposition of Cu/Nb composites is presented in this work. The electrodeposition tests were performed using 1-butyl-1-methylpyrrolidinium bis (trifluoromethylsulphonyl) imide as solvent. The electrochemical behaviour of copper and niobium ions was investigated by cyclic and linear sweep voltammetries, allowing to obtain information on potentials and mechanisms of deposition. Firstly, the electrodeposition of Nb on Cu substrate and of Cu on Nb substrate was investigated; then, the deposition of Cu and Nb in dual bath mode was considered. All the experimental tests were carried out at 125 °C under inert atmosphere, in order to avoid interference of water and oxygen. According to the electrochemistry of the metals considered and based on the experimental results, the possible reaction path for the oxidation/reduction was proposed. Deposition tests were carried out at different potentials and the related samples were analysed by scanning electron microscopy and energy dispersive X-ray spectroscopy. Structural and chemical analyses indicate that the obtained deposits cover uniformly the electrode surface and exhibit individual layers with a characteristic size ranging between 50 and 100 nm. - Highlights: • Cu/Nb composites were obtained by electro-deposition from ionic liquid. • The electrochemical behaviour was studied by cyclic and linear sweep voltammetries. • Anodic dissolution of Cu and cathodic deposition of Cu, Nb and Cu/Nb were studied. • The Cu, Nb and Cu/Nb deposits were characterised through SEM and EDX analyses. • The characteristic length of the deposits ranges between 50 and 100 nm

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2014.05.030

Additional details

Identifiers

DOI
10.1016/j.tsf.2014.05.030;
PII
S0040-6090(14)00565-3;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
571
Journal Issue
Part 2
Journal Page Range
p. 325-331
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
International workshop on the mechanical behavior of nanoscale multilayers
Acronym
Nanoscale Multilayers 2013
Dates
1-4 Oct 2013
Place
Madrid (Spain)

Optional Information

Copyright
Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.