Electrochemical deposition of Cu and Nb from pyrrolidinium based ionic liquid
Creators
- 1. Dipartimento di Ingegneria Meccanica, Chimica e dei Materiali Università degli Studi di Cagliari, via Marengo 2, 09123 Cagliari (Italy)
- 2. Laboratorio Telemicroscopia Industriale, Sardegna Ricerche, Polaris, Parco Tecnologico della Sardegna, Edificio 3, Loc. Piscinamanna, 09010 Pula, CA (Italy)
Description
A study on the electrochemical deposition of Cu/Nb composites is presented in this work. The electrodeposition tests were performed using 1-butyl-1-methylpyrrolidinium bis (trifluoromethylsulphonyl) imide as solvent. The electrochemical behaviour of copper and niobium ions was investigated by cyclic and linear sweep voltammetries, allowing to obtain information on potentials and mechanisms of deposition. Firstly, the electrodeposition of Nb on Cu substrate and of Cu on Nb substrate was investigated; then, the deposition of Cu and Nb in dual bath mode was considered. All the experimental tests were carried out at 125 °C under inert atmosphere, in order to avoid interference of water and oxygen. According to the electrochemistry of the metals considered and based on the experimental results, the possible reaction path for the oxidation/reduction was proposed. Deposition tests were carried out at different potentials and the related samples were analysed by scanning electron microscopy and energy dispersive X-ray spectroscopy. Structural and chemical analyses indicate that the obtained deposits cover uniformly the electrode surface and exhibit individual layers with a characteristic size ranging between 50 and 100 nm. - Highlights: • Cu/Nb composites were obtained by electro-deposition from ionic liquid. • The electrochemical behaviour was studied by cyclic and linear sweep voltammetries. • Anodic dissolution of Cu and cathodic deposition of Cu, Nb and Cu/Nb were studied. • The Cu, Nb and Cu/Nb deposits were characterised through SEM and EDX analyses. • The characteristic length of the deposits ranges between 50 and 100 nm
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2014.05.030Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2014.05.030;
- PII
- S0040-6090(14)00565-3;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 571
- Journal Issue
- Part 2
- Journal Page Range
- p. 325-331
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- International workshop on the mechanical behavior of nanoscale multilayers
- Acronym
- Nanoscale Multilayers 2013
- Dates
- 1-4 Oct 2013
- Place
- Madrid (Spain)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47004347
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHEMICAL ANALYSIS; COPPER; DISSOLUTION; ELECTROCHEMISTRY; ELECTRODEPOSITION; INERT ATMOSPHERE; INTERFERENCE; LAYERS; MOLTEN SALTS; NIOBIUM; NIOBIUM IONS; OXIDATION; OXYGEN; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACES; VOLTAMETRY; X-RAY SPECTROSCOPY
- Descriptors DEC
- ATMOSPHERES; CHARGED PARTICLES; CHEMICAL REACTIONS; CHEMISTRY; CONTROLLED ATMOSPHERES; DEPOSITION; ELECTROLYSIS; ELECTRON MICROSCOPY; ELEMENTS; IONS; LYSIS; METALS; MICROSCOPY; NONMETALS; REFRACTORY METALS; SALTS; SPECTROSCOPY; SURFACE COATING; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.