Modified SPC for short run test and measurement process in multi-stations
Creators
- 1. School of Mechanical Engineering, Universiti Sains Malaysia, 14300, Nibong Tebal, Pulau Pinang (Malaysia)
- 2. Department of Mechanical Engineering, Universiti Teknologi PETRONAS, 32610, Seri Iskandar, Perak (Malaysia)
Description
Due to short production runs and measurement error inherent in electronic test and measurement (T&M) processes, continuous quality monitoring through real-time statistical process control (SPC) is challenging. Industry practice allows the installation of guard band using measurement uncertainty to reduce the width of acceptance limit, as an indirect way to compensate the measurement errors. This paper presents a new SPC model combining modified guard band and control charts ( chart and W chart) for short runs in T&M process in multi-stations. The proposed model standardizes the observed value with measurement target (T) and rationed measurement uncertainty (U). S-factor (S f) is introduced to the control limits to improve the sensitivity in detecting small shifts. The model was embedded in automated quality control system and verified with a case study in real industry. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1757-899X/328/1/012009Additional details
Identifiers
Publishing Information
- Journal Title
- IOP Conference Series. Materials Science and Engineering (Online)
- Journal Volume
- 328
- Journal Issue
- 1
- Journal Page Range
- [10 p.]
- ISSN
- 1757-899X
Conference
- Title
- 3. International Conference on Mechanical, Manufacturing and Process Plant Engineering
- Acronym
- ICMMPE 2017
- Dates
- 22-23 Nov 2017
- Place
- Batu Ferringhi (Malaysia)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 52082206
- Subject category
- S42: ENGINEERING;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CONTROL SYSTEMS; ERRORS; MONITORING; PROCESS CONTROL; QUALITY CONTROL; SENSITIVITY
- Descriptors DEC
- CONTROL