Reflection high-energy electron diffraction studies of vicinal Si(111) surfaces

Analysis of the reflection high-energy electron diffraction (RHEED) patterns from the vicinal Si(111) surfaces misoriented to [112-bar] shows that step bunching takes place on the surface, and the surface breaks up into (111) and (331) facets. A previously unreported superstructure is found on the (331) facet. From the temperature dependence of the diffraction spot positions, this superstructure and the 7 x 7 structure on the (111) facet are shown to cause the reconstruction-induced faceting. (author)