Some recent observations on the properties of UHV-deposited ZrO/sub 2/
- 1. K.C. Jungling: Univ. of New Mexico, Albuquerque, NM
Description
Single-layer ZrO/sub 2/ coatings were deposited in an ultrahigh vacuum system by two techniques: laser evaporation (utilizing a 100-W, continuous wave, CO/sub 2/ laser) and electron-beam evaporation. Substrate temperatures were maintained at either 1500C or 2500C with backfill oxygen pressures between 0 and 5x10/sup -5/ torr. The coatings were analyzed by Auger Electron Spectroscopy to determine stoichiometry and to provide information on the nature and level of impurities. The refractive indices for the coatings were determined by ellipsometry at 6328 A. Selected coatings were damage tested at 531 nm. This report discusses the influence of backfill pressure, substrate temperature and evaporation technique on thin film properties and compares the results obtained by Auger and ellipsometric analyses. Also presented is a comparison between films prepared under high vacuum and ultrahigh vacuum conditions
Additional details
Publishing Information
- Publisher
- National Bureau of Standards.
- Imprint Place
- Gaithersburg, MD (USA)
- Imprint Title
- Laser induced damage in optical materials: 1984
- Journal Page Range
- p. 171-179.
Conference
- Title
- Symposium on optical materials for high power lasers.
- Dates
- 15-17 Oct 1984.
- Place
- Boulder, CO (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 18072637
- Subject category
- S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- AUGER ELECTRON SPECTROSCOPY; CARBON DIOXIDE LASERS; CHEMICAL PREPARATION; FILMS; IMPURITIES; LASER RADIATION; MEASURING METHODS; PHYSICAL RADIATION EFFECTS; POLARIZATION; PRESSURE DEPENDENCE; REFRACTIVE INDEX; STOICHIOMETRY; SURFACE COATING; TEMPERATURE DEPENDENCE; VACUUM COATING; VACUUM EVAPORATION; VACUUM SYSTEMS; ZIRCONIUM OXIDES
- Descriptors DEC
- AMPLIFIERS; CHALCOGENIDES; DEPOSITION; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; EQUIPMENT; EVAPORATION; GAS LASERS; LASERS; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHASE TRANSFORMATIONS; PHYSICAL PROPERTIES; RADIATION EFFECTS; RADIATIONS; SPECTROSCOPY; SYNTHESIS; TRANSITION ELEMENT COMPOUNDS; ZIRCONIUM COMPOUNDS