A flexible multi-stimuli in situ (S)TEM: Concept, optical performance, and outlook
Creators
- 1. Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH (United Kingdom)
- 2. IFW Dresden, PF 27 01 16, 01171 Dresden (Germany)
- 3. Speziallabor Triebenberg, Technische Universität Dresden, 01062 Dresden (Germany)
- 4. CEOS GmbH, Englerstraße 28, 69126 Heidelberg (Germany)
Description
The progress in (scanning) transmission electron microscopy development had led to an unprecedented knowledge of the microscopic structure of functional materials at the atomic level. Additionally, although not widely used yet, electron holography is capable to map the electric and magnetic potential distributions at the sub-nanometer scale. Nevertheless, in situ studies inside a (scanning) transmission electron microscope ((S)TEM) are extremely challenging because of the much restricted size and accessibility of the sample space. Here, we introduce a concept for a dedicated in situ (S)TEM with a large sample chamber for flexible multi-stimuli experimental setups and report about the electron optical performance of the instrument. We demonstrate a maximum resolving power of about 1 nm in conventional imaging mode and substantially better than 5 nm in scanning mode while providing an effectively usable "pole piece gap" of 70 mm. - Highlights: • A concept for a (S)TEM with a large sample chamber is outlined. • An actual microscope is modified and has now a 70 mm high sample space. • The resolving power is about 1 nm in TEM and better than 5 nm in STEM mode. • Possible dedicated in situ microscopes with present technology are discussed
Availability note (English)
Available from http://dx.doi.org/10.1016/j.ultramic.2014.11.011Additional details
Identifiers
- DOI
- 10.1016/j.ultramic.2014.11.011;
- PII
- S0304-3991(14)00218-6;
Publishing Information
- Journal Title
- Ultramicroscopy (Amsterdam)
- Journal Volume
- 151
- Journal Page Range
- p. 31-36
- ISSN
- 0304-3991
- CODEN
- ULTRD6
Conference
- Title
- 3. conference on frontiers of aberration corrected electron microscopy
- Acronym
- PICO 2015
- Dates
- 19-23 Apr 2015
- Place
- Kasteel Vaalsbroek (Netherlands)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47038163
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ELECTRONS; HOLOGRAPHY; MATERIALS; MICROSCOPES; POTENTIALS; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- ELECTRON MICROSCOPY; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; MICROSCOPY
Optional Information
- Copyright
- Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.