Published April 2015 | Version v1
Journal article

A flexible multi-stimuli in situ (S)TEM: Concept, optical performance, and outlook

  • 1. Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH (United Kingdom)
  • 2. IFW Dresden, PF 27 01 16, 01171 Dresden (Germany)
  • 3. Speziallabor Triebenberg, Technische Universität Dresden, 01062 Dresden (Germany)
  • 4. CEOS GmbH, Englerstraße 28, 69126 Heidelberg (Germany)

Description

The progress in (scanning) transmission electron microscopy development had led to an unprecedented knowledge of the microscopic structure of functional materials at the atomic level. Additionally, although not widely used yet, electron holography is capable to map the electric and magnetic potential distributions at the sub-nanometer scale. Nevertheless, in situ studies inside a (scanning) transmission electron microscope ((S)TEM) are extremely challenging because of the much restricted size and accessibility of the sample space. Here, we introduce a concept for a dedicated in situ (S)TEM with a large sample chamber for flexible multi-stimuli experimental setups and report about the electron optical performance of the instrument. We demonstrate a maximum resolving power of about 1 nm in conventional imaging mode and substantially better than 5 nm in scanning mode while providing an effectively usable "pole piece gap" of 70 mm. - Highlights: • A concept for a (S)TEM with a large sample chamber is outlined. • An actual microscope is modified and has now a 70 mm high sample space. • The resolving power is about 1 nm in TEM and better than 5 nm in STEM mode. • Possible dedicated in situ microscopes with present technology are discussed

Availability note (English)

Available from http://dx.doi.org/10.1016/j.ultramic.2014.11.011

Additional details

Identifiers

DOI
10.1016/j.ultramic.2014.11.011;
PII
S0304-3991(14)00218-6;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
151
Journal Page Range
p. 31-36
ISSN
0304-3991
CODEN
ULTRD6

Conference

Title
3. conference on frontiers of aberration corrected electron microscopy
Acronym
PICO 2015
Dates
19-23 Apr 2015
Place
Kasteel Vaalsbroek (Netherlands)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47038163
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ELECTRONS; HOLOGRAPHY; MATERIALS; MICROSCOPES; POTENTIALS; TRANSMISSION ELECTRON MICROSCOPY
Descriptors DEC
ELECTRON MICROSCOPY; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; MICROSCOPY

Optional Information

Copyright
Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.