Published May 2016 | Version v1
Journal article Metadata-only

Recent applications of hard x-ray photoelectron spectroscopy

Creators

  • 1. National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States)
  • 2. National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973 (United States)
  • 3. SLAC National Accelerator Laboratory, Menlo Park, California 94025 (United States)

Description

Recent applications of hard x-ray photoelectron spectroscopy (HAXPES) demonstrate its many capabilities in addition to several of its limitations. Examples are given, including measurement of buried interfaces and materials under in situ or in operando conditions, as well as measurements under x-ray standing-wave and resonant excitation. Physical considerations that differentiate HAXPES from photoemission measurements utilizing soft x-ray and ultraviolet photon sources are also presented.

Additional details

Identifiers

DOI
10.1116/1.4946046;

Publishing Information

Journal Title
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Journal Volume
34
Journal Issue
3
Journal Page Range
p. 030801-030801.21
ISSN
0734-2101
CODEN
JVTAD6

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
48037443
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
EXCITATION; HARD X RADIATION; INTERFACES; PHOTOEMISSION; PHOTONS; SOFT X RADIATION; STANDING WAVES; ULTRAVIOLET RADIATION; X-RAY PHOTOELECTRON SPECTROSCOPY
Descriptors DEC
BOSONS; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ELEMENTARY PARTICLES; EMISSION; ENERGY-LEVEL TRANSITIONS; IONIZING RADIATIONS; MASSLESS PARTICLES; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; SECONDARY EMISSION; SPECTROSCOPY; X RADIATION

Optional Information

Notes
(c) 2016 U.S. Government