Published April 1, 2013 | Version v1
Journal article

Nanoliter deposition unit for pipetting droplets of small volumes for Total Reflection X-ray Fluorescence applications

Description

A nanoliter droplet deposition unit was developed and characterized for application of sample preparation in TXRF. The droplets produced on quartz reflectors as well as on wafers show a good reproducibility, also the accuracy of the pipetted volume could be proved by a quantitative TXRF analysis using an external standard. The samples were found to be independent of rotation of the sample carrier. Angle scans showed droplet residue behavior, and the fluorescence signal is relatively invariant of the angle of incidence below the critical angle, which is useful for producing standards for external calibration for semiconductor surface contamination measurements by TXRF. Further it could be demonstrated that the nanoliter deposition unit is perfectly able to produce patterns of samples for applications like the quantification of aerosols collected by impactors. - Highlights: ► The system produces very accurate and reliable samples. ► Volumes below 1 μl can be applied. ► Precise patterns can be deposited on different sample carriers. ► Typical angle independency below critical angle can be shown

Availability note (English)

Available from http://dx.doi.org/10.1016/j.sab.2013.01.006

Additional details

Identifiers

DOI
10.1016/j.sab.2013.01.006;
PII
S0584-8547(13)00026-8;

Publishing Information

Journal Title
Spectrochimica Acta. Part B, Atomic Spectroscopy
Journal Volume
82
Journal Page Range
p. 71-75
ISSN
0584-8547
CODEN
SAASBH

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46042943
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Descriptors DEI
ACCURACY; DEPOSITION; DEPOSITS; DROPLETS; FLUORESCENCE; X RADIATION
Descriptors DEC
ELECTROMAGNETIC RADIATION; EMISSION; IONIZING RADIATIONS; LUMINESCENCE; PARTICLES; PHOTON EMISSION; RADIATIONS

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.