Investigation of the emission spectra of a high-power impulse gas discharge of a magnetron during reactive sputtering

This paper presents the results of a study of the properties of a gas discharge of a magnetron during sputtering at a direct current (DCMS) and by high-power impulse method (HiPIMS). During the study, the copper target was sputtered in a mixture of argon and oxygen. It was found that, depending on the discharge parameters, sputtering is possible in two modes: oxide, during which deposition of oxide films occurs, and metal, in which deposition of metal structures is possible. As a result of the study, current-voltage characteristics, emission spectra of the gas discharge, as well as the dependence of the pressure in the vacuum chamber on the discharge current were obtained. (paper)