Published December 1, 2014 | Version v1
Journal article

Robust topological surface state in Kondo insulator SmB6 thin films

  • 1. Department of Physics, University of Maryland, College Park, Maryland 20742 (United States)
  • 2. Center for Nanophysics and Advanced Materials, University of Maryland, College Park, Maryland 20742 (United States)
  • 3. Department of Mechanical Engineering and Materials Science, Duke University, Durham, North Carolina 27708 (United States)
  • 4. Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States)
  • 5. Department of Materials Science and Engineering, University of Maryland, College Park, Maryland 20742 (United States)

Description

Fabrication of smooth thin films of topological insulators with true insulating bulk are extremely important for utilizing their novel properties in quantum and spintronic devices. Here, we report the growth of crystalline thin films of SmB6, a topological Kondo insulator with true insulating bulk, by co-sputtering both SmB6 and B targets. X-ray diffraction, Raman spectroscopy, and transmission electron microscopy indicate films that are polycrystalline with a (001) preferred orientation. When cooling down, resistivity ρ shows an increase around 50 K and saturation below 10 K, consistent with the opening of the hybridization gap and surface dominated transport, respectively. The ratio ρ2K300K is only about two, much smaller than that of bulk, which indicates a much larger surface-to-bulk ratio. Point contact spectroscopy using a superconductor tip on SmB6 films shows both a Kondo Fano resonance and Andeev reflection, indicating an insulating Kondo lattice with metallic surface states

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
105
Journal Issue
22
Journal Page Range
p. 222403-222403.5
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
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